A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...
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Apple is considering using Intel’s 14A (1.4 nm) manufacturing process as a second source for producing its M-series chips. Apple may use Intel’s 14A node in addition to its current partnership with ...
To continue reading this content, please enable JavaScript in your browser settings and refresh this page. Preview this article 1 min The semiconductor giant is ...
SAN FRANCISCO (Reuters) -The production process that Intel hoped would pave the way to winning manufacturing deals and restore its edge in churning out high-end, high-margin chips is facing a big ...