The instrument is a dedicated field emission, wavelength dispersive electron microprobe (EPMA). Quantitative elemental data can be obtained from most elements (Fluorine to Uranium) with detection ...
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The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...